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Title:
AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING, CHEMICAL MECHANICAL POLISHING METHOD USING SAME, AND KIT FOR PREPARING AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING
Document Type and Number:
WIPO Patent Application WO/2011/093195
Kind Code:
A1
Abstract:
Disclosed is an aqueous dispersion for chemical mechanical polishing, which is characterized by containing abrasive grains, ferrate ions (FeO4 2-) and a dispersion medium.

Inventors:
KAWAMOTO TATSUYOSHI (JP)
ABE TAICHI (JP)
NISHIMOTO KAZUO (JP)
SHIHO HIROSHI (JP)
Application Number:
JP2011/050917
Publication Date:
August 04, 2011
Filing Date:
January 20, 2011
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Assignee:
JSR CORP (JP)
KAWAMOTO TATSUYOSHI (JP)
ABE TAICHI (JP)
NISHIMOTO KAZUO (JP)
SHIHO HIROSHI (JP)
International Classes:
H01L21/304; B24B37/04; C09K3/14
Domestic Patent References:
WO2009111001A22009-09-11
Foreign References:
JP2009503908A2009-01-29
JP2007520871A2007-07-26
Attorney, Agent or Firm:
OFUCHI, Michie et al. (JP)
Obuchi Yoshikazu glory (JP)
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Claims: