Title:
AQUEOUS SOLUTION FOR COATING RESIST PATTERN AND PATTERN FORMATION METHOD USING SAME
Document Type and Number:
WIPO Patent Application WO/2017/169981
Kind Code:
A1
Abstract:
[Problem] To provide a novel aqueous solution for coating a resist pattern. [Solution] The aqueous solution for coating a resist pattern according to the present invention comprises: component A which is a copolymer having, on the main chain, an ethylene oxide unit and an alkylene oxide unit having 3 carbon atoms, and having a hydroxy group at a terminal; component B which is a water-soluble polymer (excluding the copolymer of component A), a water-soluble monomer, or a water-soluble oligomer; and component C which is a solvent containing water as a main ingredient. The copolymer of component A is, for example, a block copolymer represented by formula (1). (In the formula: R1, R2, and R3 independently represent an ethylene group, a propylene group, or a trimethylene group; and x, y, and z independently represent an integer of 5-100.)
Inventors:
NISHITA TOKIO (JP)
SAKAMOTO RIKIMARU (JP)
SAKAMOTO RIKIMARU (JP)
Application Number:
PCT/JP2017/011230
Publication Date:
October 05, 2017
Filing Date:
March 21, 2017
Export Citation:
Assignee:
NISSAN CHEMICAL IND LTD (JP)
International Classes:
G03F7/40; G03F7/20; H01L21/027
Domestic Patent References:
| WO2015025665A1 | 2015-02-26 | |||
| WO2016190261A1 | 2016-12-01 |
Foreign References:
| JP2012141564A | 2012-07-26 | |||
| JP2006060006A | 2006-03-02 | |||
| JP2003107752A | 2003-04-09 | |||
| JP2014219577A | 2014-11-20 |
Attorney, Agent or Firm:
HANABUSA PATENT & TRADEMARK OFFICE (JP)
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