ARC-BASED FILM FORMATION DEVICE AND FILM FORMATION METHOD

WIPO Patent Application WO/2019/058587

A1

Provided is an arc-based film formation technology capable of stably forming a smooth DLC film by suppressing pulverized particles discharged from a cathode from being taken into the DLC film being formed. The arc-based film formation device is for forming a carbon film by generating arc discharge between a columnar cathode and anode, thereby causing carbon to sublimate from an arc spot formed on a surface of the cathode. The arc-based film formation device is provided with: a cathode holding means for holding the cathode; a base material holding means for holding a base material; a vacuum chamber in which the cathode holding means and the base material holding means are housed; an arc power supply connected between the cathode and the anode; a discharge starting means for causing the arc spot to be formed on an outer peripheral surface in the vicinity of the tip of the cathode; a magnetic field generation means for generating a magnetic field for forming lines of magnetic force along the axial direction of the cathode; and a space formation part where a cylindrical space is formed in a peripheral direction of the cathode, wherein an opening having a smaller diameter than the diameter of the space formation part is formed on the base material side of the space formation part.

OKAZAKI NAOTO (JP)
SHIBATA AKINORI (JP)
WATANABE JUN (JP)
MORIGUCHI HIDEKI (JP)

PCT/JP2018/007419

March 28, 2019

February 28, 2018

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NIPPON ITF INC (JP)

C23C14/24; B23B27/14; B23B27/20; C23C14/06

JP2017013136A	2017-01-19
JP2001192864A	2001-07-17
JP2002285325A	2002-10-03
JP2002327262A	2002-11-15
JPH06220621A	1994-08-09
JP2017004678A	2017-01-05

JODAI Tetsuji et al. (JP)

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