Title:
AROMATIC SULFONIUM SALT COMPOUND
Document Type and Number:
WIPO Patent Application WO/2011/062182
Kind Code:
A1
Abstract:
Provided are a photo-acid generator having good development properties and a cation polymerization initiator having good curing properties, and also provided are a resist composition and cation polymerizable composition that use the photo-acid generator and the cation polymerization initiator. Specifically, provided are a novel aromatic sulfonium salt compound represented by general formula (I), and a photo-acid generator, a cation polymerization initiator, a resist composition, and a cation polymerizable composition that use said compound. (in formula (I), R1 through R10 are optionally substituted C1-18 alkyl groups etc., R11 through R17 are optionally substituted C1-18 alkyl groups etc., R18 is an optionally substituted C1-18 alkyl group etc., and X1
- is a monovalent anion.)
Inventors:
MAKABE YOSHIE (JP)
OKUYAMA YUTA (JP)
OKUYAMA YUTA (JP)
Application Number:
PCT/JP2010/070469
Publication Date:
May 26, 2011
Filing Date:
November 17, 2010
Export Citation:
Assignee:
ADEKA CORP (JP)
MAKABE YOSHIE (JP)
OKUYAMA YUTA (JP)
MAKABE YOSHIE (JP)
OKUYAMA YUTA (JP)
International Classes:
C07D219/06; C01G30/00; C07C309/06; C08F2/50; C08G59/68; C09K3/00; G03F7/004
Domestic Patent References:
WO1997047660A1 | 1997-12-18 |
Foreign References:
JPH09143212A | 1997-06-03 | |||
JPH09157350A | 1997-06-17 | |||
JP2000186071A | 2000-07-04 | |||
JPH10251633A | 1998-09-22 | |||
JP2004053799A | 2004-02-19 | |||
JP2007112854A | 2007-05-10 | |||
JPH06184170A | 1994-07-05 | |||
JP2002526391A | 2002-08-20 | |||
JP2007285538A | 2007-11-01 | |||
JP2003192665A | 2003-07-09 | |||
JP2004323704A | 2004-11-18 | |||
JPH1010733A | 1998-01-16 |
Other References:
See also references of EP 2502915A4
Attorney, Agent or Firm:
HATORI, Osamu (JP)
Osamu Hatori (JP)
Osamu Hatori (JP)
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