ARRANGEMENT FOR USE IN A PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY HAVING A REFLECTIVE OPTICAL ELEMENT

WIPO Patent Application WO/2011/092020

A3

An arrangement for use in a projection exposure tool (100) for microlithography comprises a reflective optical element (10; 110) and a radiation detector (30; 32; 130). The reflective optical element (10; 110) comprises a carrier element (12) guaranteeing the mechanical strength of the optical element (10; 110) and a reflective coating (18) disposed on the carrier element (12) for reflecting a use radiation (20a). The carrier element (12) is made of a material which upon interaction with the use radiation (20a) emits a secondary radiation (24) the wavelength of which differs from the wavelength of the use radiation (20a), and the radiation detector (30; 32; 130) is configured to detect the secondary radiation (24).

JP2003229350	STAGE DEVICE AND ALIGNER
JPH07333167	SURFACE STATE INSPECTION DEVICE AND EXPOSURE DEVICE USING THE INSPECTION DEVICE
JP3741208	Optical members for optical lithography and their evaluation methods

EHM DIRK HEINRICH (DE)
VAN KAMPEN MAARTEN (NL)
SCHMIDT STEFAN-WOLFGANG (DE)
BANINE VADIM YEVGENYEVICH (NL)
LOOPSTRA ERIK (NL)

PCT/EP2011/000385

September 29, 2011

January 28, 2011

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ZEISS CARL SMT GMBH (DE)
ASML NETHERLANDS BV (NL)
EHM DIRK HEINRICH (DE)
VAN KAMPEN MAARTEN (NL)
SCHMIDT STEFAN-WOLFGANG (DE)
BANINE VADIM YEVGENYEVICH (NL)
LOOPSTRA ERIK (NL)

G03F7/20; G01J1/04

EP1530091A1	2005-05-11
US20060024589A1	2006-02-02
US20100014060A1	2010-01-21
US6238830B1	2001-05-29

SUMMERER, Christian et al. (Nussbaumstrasse 8, München, DE)

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