Title:
ARRAY SUBSTRATE, MANUFACTURING METHOD FOR ARRAY SUBSTRATE, AND DISPLAY PANEL
Document Type and Number:
WIPO Patent Application WO/2021/035931
Kind Code:
A1
Abstract:
An array substrate, a manufacturing method for the array substrate, and a display panel. The array substrate comprises a substrate (101), a buffer layer (103), an active layer (104), a gate insulating layer (107), a gate layer (108), an interlayer dielectric layer (109), a source-drain layer (113), and a planarization layer (113). The gate insulating layer (107) is formed on the active layer (104) and the buffer layer (103); the interlayer dielectric layer (109) is formed on the gate layer (108) and the gate insulating layer (107); the source-drain layer is patterned to form a source (110) and a drain (111), and is connected to the active layer (104) by means of a via hole (10); the planarization layer (113) is easier to fill and level up.
Inventors:
JIANG WENJUAN (CN)
Application Number:
PCT/CN2019/114127
Publication Date:
March 04, 2021
Filing Date:
October 29, 2019
Export Citation:
Assignee:
SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECH CO LTD (CN)
International Classes:
H01L21/34; H01L29/786
Foreign References:
| CN104965365A | 2015-10-07 | |||
| CN104965365A | 2015-10-07 | |||
| CN105159486A | 2015-12-16 | |||
| US20180374879A1 | 2018-12-27 | |||
| CN109300840A | 2019-02-01 |
Attorney, Agent or Firm:
ESSEN PATENT&TRADEMARK AGENCY (CN)
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