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Patent Searching and Data


Title:
ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREFOR AND LIQUID CRYSTAL DISPLAY APPARATUS
Document Type and Number:
WIPO Patent Application WO/2016/045238
Kind Code:
A1
Abstract:
Disclosed are a method for manufacturing an array substrate, an array substrate and a display apparatus, which fall within the field of liquid crystal displays. The method comprises: step 101, sequentially forming a metal oxide semiconductor layer and an etch stop layer on a gate insulator layer; step 102, carrying out a patterning process on the etch stop layer, and forming a source electrode contact area through hole, a drain electrode contact area through hole and an isolation area; step 103, forming a source-drain electrode layer on the etch stop layer having been subjected to step 102; and step 104, during the process for carrying out a patterning process on the source-drain electrode layer to form the source-drain electrode pattern, removing a part, corresponding to the isolation area, of the metal oxide semiconductor layer, so that the metal oxide semiconductor layer is disconnected in a position corresponding to the isolation area, wherein the separation area surrounds the source-drain electrode pattern.

Inventors:
LIU XIANG (CN)
Application Number:
PCT/CN2015/070024
Publication Date:
March 31, 2016
Filing Date:
January 04, 2015
Export Citation:
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Assignee:
BOE TECHNOLOGY GROUP CO LTD (CN)
International Classes:
H01L27/12; G02F1/1362; G02F1/1368; H01L21/77
Foreign References:
CN102651340A2012-08-29
CN1507656A2004-06-23
CN103928470A2014-07-16
CN101950733A2011-01-19
CN102543867A2012-07-04
Attorney, Agent or Firm:
DRAGON INTELLECTUAL PROPERTY LAW FIRM (CN)
北京银龙知识产权代理有限公司 (CN)
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