Title:
ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2019/153661
Kind Code:
A1
Abstract:
Disclosed in the present invention are an array substrate and a manufacturing method therefor. The array substrate comprises: a thin film transistor; a planarisation layer covering the thin film transistor; a hole, disposed on the planarisation layer corresponding to the position of a drain electrode of the thin film transistor, part of the planarisation layer being reserved at the bottom of the hole to form a planarisation layer thin film; also comprising a second metal layer positioned on a first insulation layer, the second metal layer being electrically connected to the drain electrode by means of the partially penetrated planarisation layer thin film. The present invention solves the problem of thin film transistors being damaged as a result of the static electricity of the insulation layer of an array substrate intruding into the thin film transistor by means of a hole, and increases the product qualification rate.
Inventors:
LU GAIPING (CN)
ZHANG JIAWEI (CN)
TANG WEI (CN)
ZHANG JIAWEI (CN)
TANG WEI (CN)
Application Number:
PCT/CN2018/096925
Publication Date:
August 15, 2019
Filing Date:
July 25, 2018
Export Citation:
Assignee:
WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO LTD (CN)
International Classes:
H01L27/12
Foreign References:
| CN103489824A | 2014-01-01 | |||
| CN107316839A | 2017-11-03 | |||
| CN107068897A | 2017-08-18 | |||
| US20070045740A1 | 2007-03-01 |
Attorney, Agent or Firm:
CHINA WISPRO INTELLECTUAL PROPERTY LLP. (CN)
Download PDF: