Title:
ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2023/184613
Kind Code:
A1
Abstract:
Provided in the present invention are an array substrate and a manufacturing method therefor. The manufacturing method for an array substrate comprises: using a first photomask to form a light-shielding layer, a source electrode and a drain electrode on a substrate; using a second photomask to form, on the source electrode, the drain electrode and the light-shielding layer, a semiconductor layer, a gate insulating layer and a gate electrode, which are stacked; manufacturing a dielectric layer on the gate electrode and the substrate, and using a third photomask to form, in the dielectric layer, a via hole that exposes the drain electrode; and using a fourth photomask to form a pixel electrode on the dielectric layer.
Inventors:
BO MEILAN (CN)
Application Number:
PCT/CN2022/087410
Publication Date:
October 05, 2023
Filing Date:
April 18, 2022
Export Citation:
Assignee:
HUIZHOU CHINA STAR OPTOELECTRONICS DISPLAY CO LTD (CN)
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD (CN)
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD (CN)
International Classes:
H01L21/34; H01L29/786
Foreign References:
| KR100648214B1 | 2006-11-24 | |||
| CN109585304A | 2019-04-05 | |||
| CN109300917A | 2019-02-01 | |||
| US20180212062A1 | 2018-07-26 |
Attorney, Agent or Firm:
PURPLEVINE INTELLECTUAL PROPERTY (SHENZHEN) CO., LTD. (CN)
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