Title:
ARRAY SUBSTRATE, AND MANUFACTURING METHOD THEREOF
Document Type and Number:
WIPO Patent Application WO/2018/032558
Kind Code:
A1
Abstract:
An array substrate, and manufacturing method thereof. The method comprises: forming, on a base substrate (100), a first metal layer, a gate insulation layer (140), a second metal layer (150), and a barrier layer (160); and forming a pattern on the barrier layer (160), such that the barrier layer (160) corresponding to a trench portion (180B) is etched to form a gap portion, wherein a width of the gap portion on the side close to the second metal layer (150) is larger than a width thereof on the side away from the second metal layer (150). By forming a trench by means of deposition, the present invention prevents an organic photoresist from causing erosion of an organic semiconductor material, thus improving performance of a thin-film transistor.
Inventors:
LIU ZHE (CN)
Application Number:
PCT/CN2016/098562
Publication Date:
February 22, 2018
Filing Date:
September 09, 2016
Export Citation:
Assignee:
WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO LTD (CN)
International Classes:
H01L21/82
Foreign References:
| CN104766877A | 2015-07-08 | |||
| CN1713057A | 2005-12-28 | |||
| CN1964023A | 2007-05-16 | |||
| US20040063254A1 | 2004-04-01 | |||
| CN101114618A | 2008-01-30 | |||
| CN102116980A | 2011-07-06 |
Attorney, Agent or Firm:
ESSEN PATENT & TRADEMARK AGENCY (CN)
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