Title:
ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF, DISPLAY DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/136873
Kind Code:
A1
Abstract:
Provided is an array substrate and a manufacturing method thereof, a display device, wherein the manufacturing method of the array substrate comprises: forming an amorphous silicon layer and an insulating layer covering the amorphous silicon layer in one deposition process (21); treating the amorphous silicon layer to change the amorphous silicon layer into a polysilicon layer (22). Through the above method, the problem that the surface of the polysilicon is oxidized to affect the carrier concentration therein can be solved, and the performance of the array substrate can be improved.
Inventors:
YU LEI (CN)
LI SONGSHAN (CN)
LI SONGSHAN (CN)
Application Number:
PCT/CN2018/083357
Publication Date:
July 18, 2019
Filing Date:
April 17, 2018
Export Citation:
Assignee:
WUHAN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECH CO LTD (CN)
International Classes:
H01L27/12; H01L21/77; H01L29/786
Foreign References:
| CN104766804A | 2015-07-08 | |||
| CN101866839A | 2010-10-20 | |||
| CN104658898A | 2015-05-27 | |||
| JP2005064453A | 2005-03-10 |
Attorney, Agent or Firm:
CHINA WISPRO INTELLECTUAL PROPERTY LLP. (CN)
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