Title:
ARRAY SUBSTRATE, MANUFACTURING METHOD THEREOF, AND DISPLAY DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/181948
Kind Code:
A1
Abstract:
The present disclosure provides an array substrate, a manufacturing method thereof, and a display device. The method comprises: forming a metal layer on the base substrate; coating the metal layer with a photoresist, and exposing the photoresist using a mask, such that the amount of light acting on a first photoresist portion is less than the amount of light acting on a second photoresist portion, so as to form a first photoresist retention portion in a fan-out region and a second photoresist retention portion in a display region; and etching away a metal portion corresponding to a photoresist removal portion from the metal layer, and then stripping off the first photoresist retention portion and the second photoresist retention portion, so as to obtain a first metal pattern in the fan-out region and a second metal pattern in the display region, wherein a periodic pitch of the first metal pattern is less than a periodic pitch of the second metal pattern.
Inventors:
ZHOU GUOQING (CN)
WANG CHAO (CN)
ZHAO SHENGWEI (CN)
LV JINGPING (CN)
XIE LIN (CN)
CHANG ZHIQIANG (CN)
WANG CHAO (CN)
ZHAO SHENGWEI (CN)
LV JINGPING (CN)
XIE LIN (CN)
CHANG ZHIQIANG (CN)
Application Number:
PCT/CN2020/075033
Publication Date:
September 17, 2020
Filing Date:
February 13, 2020
Export Citation:
Assignee:
BOE TECHNOLOGY GROUP CO LTD (CN)
ORDOS YUANSHENG OPTOELECTRONICS CO LTD (CN)
ORDOS YUANSHENG OPTOELECTRONICS CO LTD (CN)
International Classes:
H01L27/12; H01L21/77
Foreign References:
CN109920801A | 2019-06-21 | |||
CN107068692A | 2017-08-18 | |||
CN105206621A | 2015-12-30 | |||
CN105206621A | 2015-12-30 | |||
US20180004080A1 | 2018-01-04 |
Attorney, Agent or Firm:
DRAGON INTELLECTUAL PROPERTY LAW FIRM (CN)
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