Title:
ARRAY SUBSTRATE, PREPARATION METHOD THEREFOR, DISPLAY DEVICE
Document Type and Number:
WIPO Patent Application WO/2018/205947
Kind Code:
A1
Abstract:
A preparation method for an array substrate comprises: forming a semiconductor material thin film (3) on a substrate (1). The preparation method also comprises: forming a metal thin film (4) covering the semiconductor material thin film (3); and carrying out primary patterning processing on the metal thin film (4) and the semiconductor material thin film (3), so as to form an active layer (311) and a first electrode (412) of a storage capacitor, the first electrode (412) of the storage capacitor being formed by the metal thin film (4) and being located on one side of a semiconductor material retention pattern (312) that is disposed on a same layer of the active layer (311) and that is distant from the substrate (1). Also disposed are an array substrate and a display device.
Inventors:
GONG KUI (CN)
DUAN XIANXUE (CN)
CHEN CHENG (CN)
DUAN XIANXUE (CN)
CHEN CHENG (CN)
Application Number:
PCT/CN2018/086129
Publication Date:
November 15, 2018
Filing Date:
May 09, 2018
Export Citation:
Assignee:
BOE TECHNOLOGY GROUP CO LTD (CN)
HEFEI BOE OPTOELECTRONICS TECH (CN)
HEFEI BOE OPTOELECTRONICS TECH (CN)
International Classes:
H01L27/12; H01L21/77
Foreign References:
| CN107170753A | 2017-09-15 | |||
| CN101196668A | 2008-06-11 | |||
| CN1963614A | 2007-05-16 | |||
| CN105914229A | 2016-08-31 | |||
| US20010009283A1 | 2001-07-26 |
Attorney, Agent or Firm:
LIU, SHEN & ASSOCIATES (CN)
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