Title:
ASSESSMENT METHOD FOR CALCULATING LASER-INDUCED DAMAGE THRESHOLD VALUE OF DAMAGE PRECURSOR TO OPTICAL MATERIAL ON BASIS OF MULTIPLE SCALES
Document Type and Number:
WIPO Patent Application WO/2023/160046
Kind Code:
A1
Abstract:
Disclosed in the present invention is an assessment method for calculating a laser-induced damage threshold value of a damage precursor to an optical material on the basis of multiple scales. (1) In the present invention, a mie scattering theory is taken into consideration, a plurality of types of damage precursors are taken as laser absorption sources, and in view of a thermal transport model, laser energy is dynamically introduced into an optical material, so as to assess the influence of the damage precursors on a material damage threshold value, which is different from an existing simulation method for a simple surface fixed heat source (setting a local initial high temperature). (2) In the present invention, various parameters related to optical materials are covered, and damage thresholds and damage radii of various optical materials can be simulated and analyzed by means of adjusting related parameters, which is different from an existing laser-induced damage simulation model only for a single material.
Inventors:
FENG QINGYI (CN)
DENG HONGXIANG (CN)
GE CHUANPENG (CN)
DENG HONGXIANG (CN)
GE CHUANPENG (CN)
Application Number:
PCT/CN2022/133068
Publication Date:
August 31, 2023
Filing Date:
November 21, 2022
Export Citation:
Assignee:
YANGTZE DELTA REGION INSTITUTE OF UNIV OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA HUZHOU (CN)
International Classes:
G16C60/00
Foreign References:
| CN114720406A | 2022-07-08 | |||
| CN114018984A | 2022-02-08 | |||
| CN110849815A | 2020-02-28 | |||
| JP2007071831A | 2007-03-22 |
Other References:
董鲜悦 (DONG, XIANYUE): "光学材料强激光诱导损伤的吸收波前模型研究 (Non-official translation: Study on Absorption Wavefront Model of Intense Laser-Induced Damage in Optical Materials)", 中国优秀硕士学位论文全文数据库 基础科学辑 (BASIC SCIENCES, CHINA MASTER'S THESES FULL-TEXT DATABASE), no. 1, 15 January 2020 (2020-01-15), ISSN: 1674-0246
FENG QINGYI, LI LI, ZENG TUQIANG, ZHANG MINGWEN, NIE JINLAN, XIAO HAIYAN, SU RUI, ZU XIAOTAO: "Ab initio molecular dynamics simulation of the effect of impurities on laser-induced damage of fused silica", PHYSICA B: CONDENSED MATTER, ELSEVIER, AMSTERDAM, NL, vol. 545, 1 September 2018 (2018-09-01), AMSTERDAM, NL , pages 549 - 558, XP093086879, ISSN: 0921-4526, DOI: 10.1016/j.physb.2018.05.029
FENG QINGYI, LI LI, ZENG TUQIANG, ZHANG MINGWEN, NIE JINLAN, XIAO HAIYAN, SU RUI, ZU XIAOTAO: "Ab initio molecular dynamics simulation of the effect of impurities on laser-induced damage of fused silica", PHYSICA B: CONDENSED MATTER, ELSEVIER, AMSTERDAM, NL, vol. 545, 1 September 2018 (2018-09-01), AMSTERDAM, NL , pages 549 - 558, XP093086879, ISSN: 0921-4526, DOI: 10.1016/j.physb.2018.05.029
Attorney, Agent or Firm:
SCIHEAD IP LAW FIRM (CN)
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