ATOMIC LAYER DEPOSITION (ALD) FOR MULTI-LAYER CERAMIC CAPACITORS (MLCCs)

WIPO Patent Application WO/2021/168158

A3

The use of Atomic Layer Deposition (ALD) and Molecular Layer Deposition (MLD) applied to powders and intermediates of the MLCC fabrication process can provide significant advantages. Coating metal particles within a defined range of ALD cycles is shown to provide enhanced oxidation resistance. Surprisingly, a very thin ALD layer was found to substantially increase sintering temperature.

HIGGS DANIEL (US)
GUMP CHRIS (US)
BUECHLER KAREN (US)
WARNER JEANETTE (US)
NELSON PAUL (US)
KING DAVID M (US)
DAMERON ARRELAINE (US)
TREVEY JAMES (US)

PCT/US2021/018635

December 02, 2021

February 18, 2021

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FORGE NANO INC (US)

B22F1/05; B22F1/16; H01G4/008; H01G4/12; H01G4/30

US20050262966A1	2005-12-01
US20140054514A1	2014-02-27
US20190062914A1	2019-02-28
US20160035490A1	2016-02-04
US20160271700A1	2016-09-22

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ROSENBERG, Frank (US)

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