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Patent Searching and Data


Title:
ATOMIC LAYER DEPOSITION-INHIBITING MATERIAL
Document Type and Number:
WIPO Patent Application WO/2016/147941
Kind Code:
A1
Abstract:
The present invention provides an atomic layer deposition-inhibiting material configured of a fluorine-containing resin having a fluorine content of 30 at% or greater, having at least one tertiary carbon or quaternary carbon, and lacking ester groups, hydroxyl groups, carboxyl groups, and imide groups.

Inventors:
IWAJI, Naoki (10-1, Higashikotari 1-chome, Nagaokakyo-sh, Kyoto 55, 〒6178555, JP)
Application Number:
JP2016/057067
Publication Date:
September 22, 2016
Filing Date:
March 08, 2016
Export Citation:
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Assignee:
MURATA MANUFACTURING CO., LTD. (10-1, Higashikotari 1-chome Nagaokakyo-sh, Kyoto 55, 〒6178555, JP)
International Classes:
C23C16/04; H01G4/12; H01G4/33
Domestic Patent References:
WO2014116500A12014-07-31
Foreign References:
JP2013545286A2013-12-19
US20120052681A12012-03-01
JP2013254874A2013-12-19
JP2004259661A2004-09-16
JP2010540773A2010-12-24
Attorney, Agent or Firm:
SAMEJIMA, Mutsumi et al. (AOYAMA & PARTNERS, Umeda Hankyu Bldg. Office Tower 8-1, Kakuda-cho, Kita-ku, Osaka-sh, Osaka 17, 〒5300017, JP)
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