ATOMIZATION DEVICE SPRAYING METHOD

WIPO Patent Application WO/2023/241040

A1

An atomization device spraying method. An atomization device comprises a first atomization disc (10) and a second atomization disc (20) which are coaxially arranged and rotate in opposite directions, the diameter of the first atomization disc (10) being less than the diameter of the second atomization disc (20). The method comprises: acquiring a spraying parameter of the atomization device; determining a target particle size DF of target droplets; according to the spraying parameter and a preset model, adjusting the rotating speed N of the second atomization disc to a target rotating speed for outputting the target droplets having the target particle size DF, wherein the preset model is at least constructed by means of a secondary atomization factor α determined according to the rotating speed N of the second atomization disc; and performing a spraying operation by means of the target droplets having the target particle size DF. The spraying method ensures the effect of qualitative and quantitative adjustment of the target particle size DF by adjusting the rotating speed N of the second atomization disc.

WO/2003/086654	A SPRAYING DEVICE
JPH02174959	COATING APPARATUS
JP3867176	APPARATUS FOR MEASURING MASS FLOW RATE OF POWDER AND STATIC POWDER-PAINTING APPARATUS ADOPTING THE SAME

WANG XINYU (CN)
SONG DALEI (CN)
LIU HOUCHEN (CN)
SHAO YANG (CN)

PCT/CN2023/072031

December 21, 2023

January 13, 2023

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SUZHOU EAVISION ROBOTICS TECH CO LTD (CN)

B05B12/08; B05B3/10

CN208512829U	2019-02-19
CN114918060A	2022-08-19
CN108568358A	2018-09-25
JP2013192979A	2013-09-30
US20210229118A1	2021-07-29

SUZHOU YOUJIA INTELLECTUAL PROPERTY AGENCY (GENERAL PARTNERSHIP) (CN)

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