Title:
ATTRACTION DEVICE, METHOD FOR PRODUCING ATTRACTION DEVICE, AND VACUUM PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2016/159342
Kind Code:
A1
Abstract:
The present invention provides a technique with which it is possible to suppress the generation of dust at the time of attracting and detaching an object to be attracted, and to control the attraction force of an attraction device so as to be uniform. This attraction device comprises: a main body part 50 including attraction electrodes 11, 12 in a dielectric; and an attraction part 51 that is provided on an attraction-side surface of the main body part 50 and that attracts a substrate. The attraction part 51 includes: a contact support part 52 that contacts and supports the substrate; and a non-contact part 53 that does not contact the substrate. The attraction part 51 is constituted such that the volume resistivity of the material of the contact support part 52 is greater than the volume resistivity of the material of the non-contact part 53.
Inventors:
MAEHIRA KEN (JP)
FUWA KOU (JP)
FUWA KOU (JP)
Application Number:
PCT/JP2016/060909
Publication Date:
October 06, 2016
Filing Date:
April 01, 2016
Export Citation:
Assignee:
ULVAC INC (JP)
International Classes:
H01L21/683; H02N13/00; B23Q3/15
Foreign References:
| JP2006287210A | 2006-10-19 | |||
| JP2009302347A | 2009-12-24 |
Attorney, Agent or Firm:
ABE, Hideki et al. (JP)
Hideki Abe (JP)
Hideki Abe (JP)
Download PDF: