Title:
AUTOMATIC PROPORTIONING SYSTEM FOR PHOTORESIST CLEANING LIQUID PRODUCTION AND PROPORTIONING METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2023/231226
Kind Code:
A1
Abstract:
The present application relates to the field of photoresist cleaning liquids under intelligent manufacturing, and particularly discloses an automatic proportioning system for photoresist cleaning liquid production and a proportioning method therefor. The automatic proportioning system for photoresist cleaning liquid production intelligently determines the local optimal qualities of formula ingredients one by one by using a deep-learning-based neural network technique, and determines, in this way, the optimum ratio of a photoresist cleaning liquid for a specific object, such that automatic proportioning is performed on the basis of the optimum ratio.
Inventors:
HUANG BINBIN (CN)
YUAN RUIMING (CN)
LUO SHUANG (CN)
LIN JINHUA (CN)
LUO YONGCHUN (CN)
LAI ZHILIN (CN)
YUAN RUIMING (CN)
LUO SHUANG (CN)
LIN JINHUA (CN)
LUO YONGCHUN (CN)
LAI ZHILIN (CN)
Application Number:
PCT/CN2022/119002
Publication Date:
December 07, 2023
Filing Date:
September 15, 2022
Export Citation:
Assignee:
FUJIAN TIANFU ELECTRONIC MAT CO LTD (CN)
International Classes:
G06N3/08; B01F35/80; G06F17/16; G06N3/04
Foreign References:
CN115018068A | 2022-09-06 | |||
CN114141320A | 2022-03-04 | |||
CN114417522A | 2022-04-29 | |||
CN112698554A | 2021-04-23 | |||
CN114519394A | 2022-05-20 | |||
US20220092659A1 | 2022-03-24 | |||
US20220121871A1 | 2022-04-21 |
Attorney, Agent or Firm:
BEIJING HENGTAI MINGRUI INTELLECTUAL PROPERTY ACT FOR LIMITED COMPANY (CN)
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