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Patent Searching and Data


Title:
AUTOMATIC PROPORTIONING SYSTEM FOR PHOTORESIST CLEANING LIQUID PRODUCTION AND PROPORTIONING METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2023/231226
Kind Code:
A1
Abstract:
The present application relates to the field of photoresist cleaning liquids under intelligent manufacturing, and particularly discloses an automatic proportioning system for photoresist cleaning liquid production and a proportioning method therefor. The automatic proportioning system for photoresist cleaning liquid production intelligently determines the local optimal qualities of formula ingredients one by one by using a deep-learning-based neural network technique, and determines, in this way, the optimum ratio of a photoresist cleaning liquid for a specific object, such that automatic proportioning is performed on the basis of the optimum ratio.

Inventors:
HUANG BINBIN (CN)
YUAN RUIMING (CN)
LUO SHUANG (CN)
LIN JINHUA (CN)
LUO YONGCHUN (CN)
LAI ZHILIN (CN)
Application Number:
PCT/CN2022/119002
Publication Date:
December 07, 2023
Filing Date:
September 15, 2022
Export Citation:
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Assignee:
FUJIAN TIANFU ELECTRONIC MAT CO LTD (CN)
International Classes:
G06N3/08; B01F35/80; G06F17/16; G06N3/04
Foreign References:
CN115018068A2022-09-06
CN114141320A2022-03-04
CN114417522A2022-04-29
CN112698554A2021-04-23
CN114519394A2022-05-20
US20220092659A12022-03-24
US20220121871A12022-04-21
Attorney, Agent or Firm:
BEIJING HENGTAI MINGRUI INTELLECTUAL PROPERTY ACT FOR LIMITED COMPANY (CN)
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