Title:
AZO COMPOUNDS AND PROCESS FOR PREPARING THE SAME
Document Type and Number:
WIPO Patent Application WO/1998/016587
Kind Code:
A1
Abstract:
Novel monoazo compounds excellent in water, chemical and solvent resistances and other properties and synthesized by using 2-hydroxynaphthalene-3,6-dicarboxylic acid (or a salt thereof), amide, ureide, or an ester thereof as a coupler.
Inventors:
UENO RYUZO (JP)
KITAYAMA MASAYA (JP)
MINAMI KENJI (JP)
WAKAMORI HIROYUKI (JP)
KITAYAMA MASAYA (JP)
MINAMI KENJI (JP)
WAKAMORI HIROYUKI (JP)
Application Number:
PCT/JP1997/003637
Publication Date:
April 23, 1998
Filing Date:
October 09, 1997
Export Citation:
Assignee:
UENO SEIYAKU OYO KENKYUJO KK (JP)
UENO RYUZO (JP)
KITAYAMA MASAYA (JP)
MINAMI KENJI (JP)
WAKAMORI HIROYUKI (JP)
UENO RYUZO (JP)
KITAYAMA MASAYA (JP)
MINAMI KENJI (JP)
WAKAMORI HIROYUKI (JP)
International Classes:
C07D213/75; C07D233/90; C07D235/26; C07D277/38; C07D277/44; C07D277/46; C07D277/82; C09B29/15; C09B29/20; (IPC1-7): C09B29/20; C09D7/12; C09D11/00; C08J3/20
Foreign References:
| JPS5710649A | 1982-01-20 | |||
| JPS56100859A | 1981-08-13 | |||
| JPS51119719A | 1976-10-20 |
Other References:
See also references of EP 0881267A4
Attorney, Agent or Firm:
Aoyama, Tamotsu (IMP Building 3-7, Shiromi 1-chome, Chuo-k, Osaka-shi Osaka 540, JP)
Download PDF:
Previous Patent: NONAQUEOUS DRAG REDUCING SUSPENSIONS
Next Patent: RADIATION CURABLE INK COMPOSITION AND ITS USE
Next Patent: RADIATION CURABLE INK COMPOSITION AND ITS USE