Title:
BAKING METHOD FOR CHAMBER OF GAS LASER APPARATUS, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
Document Type and Number:
WIPO Patent Application WO/2023/170835
Kind Code:
A1
Abstract:
This baking method for a chamber of a gas laser apparatus is applied to a gas laser apparatus having a chamber that has an interior space in which a beam is generated, the gas laser apparatus being provided with, on the outside of a sidewall in contact with the interior space of the chamber, a cooling passage configured so as to allow a flow of a cooling medium for cooling the chamber, the baking method comprising: a heating step of, prior to generating the beam in the interior space, letting a heating medium flow in the cooling passage so as to heat the interior space through the sidewall; and a discharge step of discharging gas in the heated interior space to an exterior space of the chamber.
Inventors:
TATSUMI TAKAHIRO (JP)
Application Number:
PCT/JP2022/010366
Publication Date:
September 14, 2023
Filing Date:
March 09, 2022
Export Citation:
Assignee:
GIGAPHOTON INC (JP)
International Classes:
H01S3/041; H01S3/036
Domestic Patent References:
| WO2015186272A1 | 2015-12-10 |
Foreign References:
| JPH06125123A | 1994-05-06 | |||
| JP2005119181A | 2005-05-12 | |||
| JP2010219516A | 2010-09-30 | |||
| JP2006013232A | 2006-01-12 | |||
| JPS61176179A | 1986-08-07 | |||
| JPH01283980A | 1989-11-15 | |||
| JP2001148526A | 2001-05-29 | |||
| JP2002164593A | 2002-06-07 | |||
| JPH03248486A | 1991-11-06 | |||
| JP2010212546A | 2010-09-24 | |||
| US4317088A | 1982-02-23 |
Attorney, Agent or Firm:
MORIMURA Yasuo (JP)
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