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Title:
BASE MATERIAL FOR RADIATION GRAFT POLYMERIZATION AND RAW MATERIAL FOR FILTER
Document Type and Number:
WIPO Patent Application WO/2000/009797
Kind Code:
A1
Abstract:
One embodiment of the invention is a polymeric base material in the form of a woven or nonwoven fabric for radiation graft polymerization characterized by comprising a woven or nonwoven fabric comprised of polymer fibers and a polymeric reinforcing agent which has higher strength and exhibits a lower rate for radiation graft polymerization than those with respect to said polymer fibers, and a raw material for radiation polymerization obtained from said polymeric base material. Another embodiment is a woven or nonwoven fabric material comprising polymer monofilaments having been subjected to a radiation graft polymerization treatment characterized in that the surface portion of said monofilaments is graft-polymerized by radiation and the central portion thereof remains ungrafted. A still other embodiment is a method for the radiation graft polymerization treatment of a woven or nonwoven fabric base material comprising polymer fibers.

Inventors:
SUGO TAKANOBU (JP)
FUJIWARA KUNIO (JP)
KAWAZU HIDEO (JP)
MASUBUCHI TERUO (JP)
KANNO JUNICHI (JP)
ENDO NAOTOSHI (JP)
AKAHORI MASAJI (JP)
Application Number:
PCT/JP1999/004307
Publication Date:
February 24, 2000
Filing Date:
August 10, 1999
Export Citation:
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Assignee:
EBARA CORP (JP)
JAPAN ATOMIC ENERGY RES INST (JP)
SUGO TAKANOBU (JP)
FUJIWARA KUNIO (JP)
KAWAZU HIDEO (JP)
MASUBUCHI TERUO (JP)
KANNO JUNICHI (JP)
ENDO NAOTOSHI (JP)
AKAHORI MASAJI (JP)
International Classes:
B01D39/08; B01D39/16; D06M10/00; D06M14/26; (IPC1-7): D06M14/26; B01D39/08; B01D39/16
Foreign References:
JPH07290627A1995-11-07
JPH09173733A1997-07-08
JPH01292174A1989-11-24
Attorney, Agent or Firm:
Shamoto, Ichio (Section 206 New Ohtemachi Building 2-1, Ohtemachi 2-chome Chiyoda-ku Tokyo, JP)
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