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Patent Searching and Data


Title:
BASE MATERIAL
Document Type and Number:
WIPO Patent Application WO/2019/098230
Kind Code:
A1
Abstract:
The present invention provides a base material having, provided to the surface, a surface treatment layer formed from a perfluoropolyether group-containing compound, wherein the gradient of a linear approximation straight line, which is created on the basis of measurement values (degrees) of the static contact angle of water relative to the number of times (times) a friction element is moved back and forth, namely 0 times, 1000 times, 2000 times, 3000 times, and 4000 times (with the caveat that, at the maximum number of times, the measurement value of the static contact angle of water is initially less than 80 degrees), in a friction test in which the friction element is moved back and forth on the surface of the base material at a speed of 40 mm/sec, in an atmosphere having a temperature of 21˚C and a humidity of 65%, while applying a load to the friction element such that a load of 5N is applied to the base material, is over -0.0096. The friction element is formed from silicone which has been covered with a testing fabric (ABREX (registered trademark) standard cotton soiling textile FINE which is made by INNOWEP, and which has been soaked in a synthetic sweat comprising 5.5 g of trisodium phosphate, 10 g of sodium chloride, 3.1 g of lactic acid, 5g of lysine, and 100 ml of distilled water).

Inventors:
MITSUHASHI HISASHI (JP)
OZAWA KAORI (JP)
NOSE MASATOSHI (JP)
WATANABE YUUSUKE (JP)
HUPFIELD PETER (DE)
Application Number:
PCT/JP2018/042110
Publication Date:
May 23, 2019
Filing Date:
November 14, 2018
Export Citation:
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Assignee:
DAIKIN IND LTD (JP)
International Classes:
B32B27/30; C08G65/00; C09D5/00; C09D171/00; C09K3/18
Domestic Patent References:
WO2014069592A12014-05-08
WO2014163057A12014-10-09
WO2016190047A12016-12-01
Foreign References:
JP2015511174A2015-04-16
JP2015168785A2015-09-28
JP2015007235A2015-01-15
JP2017082194A2017-05-18
JP2016183319A2016-10-20
Attorney, Agent or Firm:
YAMAO, Norihito et al. (JP)
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