Title:
BASE, METHOD FOR FORMING CONDUCTIVE PATTERN, AND ORGANIC THIN FILM TRANSISTOR
Document Type and Number:
WIPO Patent Application WO/2010/010851
Kind Code:
A1
Abstract:
Disclosed is a base having excellent thin-line reproducibility and excellent adhesion to conductive wiring. A method for forming a conductive pattern using the base and an organic thin film transistor using the base are also disclosed. The base is characterized by containing a compound represented by general formula (I) and a sensitizing dye. (R)n-Si(A)3-n-(B) (I) (In the formula, R represents an alkyl group having 8 or less carbon atoms; A represents an alkoxy group or a halogen atom; B represents a substituent containing an SH group; and n represents an integer of 0-2.)
Inventors:
HAKII Takeshi (Inc. 1, Sakura-machi, Hino-sh, Tokyo 11, 〒1918511, JP)
Application Number:
JP2009/062963
Publication Date:
January 28, 2010
Filing Date:
July 17, 2009
Export Citation:
Assignee:
Konica Minolta Holdings, Inc. (6-1 Marunouchi 1-chome, Chiyoda-ku Tokyo, 05, 〒1000005, JP)
コニカミノルタホールディングス株式会社 (〒05 東京都千代田区丸の内一丁目６番１号 Tokyo, 〒1000005, JP)
コニカミノルタホールディングス株式会社 (〒05 東京都千代田区丸の内一丁目６番１号 Tokyo, 〒1000005, JP)
International Classes:
H01L21/288; C23C18/18; H01B13/00; H01L21/28; H01L29/786; H01L51/05; H01L51/40; H05K3/10; H05K3/20
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