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Patent Searching and Data


Title:
BASE STATION AND CLEANING SYSTEM
Document Type and Number:
WIPO Patent Application WO/2022/142309
Kind Code:
A1
Abstract:
A base station (100) and a cleaning system. The base station (100) comprises: a housing (1), a cleaning portion (2), and a ventilation flow channel. The housing (1) comprises a cleaning recess (11) and an accommodation space (12). The accommodation space (12) is arranged on the lower part of the housing (1). The cleaning recess (11) is arranged below the accommodation space (12), and is in communication with the accommodation space (12). The cleaning portion (2) is arranged in the cleaning recess (11), and is used for cleaning a cleaning member of a device to be cleaned located in the accommodation space (12). The ventilation flow channel is arranged in the housing (1). An air inlet end of the ventilation flow channel is connected to a drive device, and an air outlet end of the ventilation flow channel extends into the accommodation space (12) and is disposed towards the cleaning recess (11). Since the base station (100) is provided with the ventilation flow channel, after the cleaning portion (2) cleans the device to be cleaned, the cleaning recess (11) and the cleaning member of said device can be simultaneously dried in time by means of the ventilation flow channel.

Inventors:
ZHOU WEI (CN)
HUANG JIANMING (CN)
CHENG FUPING (CN)
LI BING (CN)
Application Number:
PCT/CN2021/108948
Publication Date:
July 07, 2022
Filing Date:
July 28, 2021
Export Citation:
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Assignee:
MIDEA ROBOZONE TECH CO LTD (CN)
International Classes:
A47L11/40
Domestic Patent References:
WO2018107465A12018-06-21
Foreign References:
CN209629585U2019-11-15
CN209404651U2019-09-20
CN110464265A2019-11-19
CN109316136A2019-02-12
CN109662659A2019-04-23
Attorney, Agent or Firm:
CHANG TSI & PARTNERS (CN)
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