Title:
BATCH-TYPE EPITAXIAL LAYER FORMING DEVICE AND A METHOD FOR FORMING THE SAME
Document Type and Number:
WIPO Patent Application WO/2011/037377
Kind Code:
A2
Abstract:
Disclosed is a batch-type epitaxial layer forming device (100). A feature of the batch-type epitaxial layer forming device (100) according to the present invention is that a boat (120), on which a plurality of substrates (10) are stably mounted while epitaxial layers are formed, rotates inside a chamber (110) providing a space for the formation of epitaxial layers; and another feature is that it comprises: the chamber (110) which provides the space for the formation of epitaxial layers; the boat (120) which comprises a plurality of supporting shelves (121) for supporting a plurality of substrate holders (140) on which a plurality of substrates (10) are stably mounted; a heater (130) for applying heat to the plurality of substrates (10); a gas-supply part (150) for supplying process gas into the chamber (110); and a gas-venting part (160) for venting the process gas outside the chamber (110).
Inventors:
KIM DONG JEE (KR)
Application Number:
PCT/KR2010/006405
Publication Date:
March 31, 2011
Filing Date:
September 17, 2010
Export Citation:
Assignee:
TG SOLAR CORP (KR)
KIM DONG JEE (KR)
KIM DONG JEE (KR)
International Classes:
H01L21/20
Foreign References:
| KR20070100125A | 2007-10-10 | |||
| KR20080035984A | 2008-04-24 | |||
| KR100745130B1 | 2007-07-26 | |||
| KR100865581B1 | 2008-10-28 |
Attorney, Agent or Firm:
KIM, HAN (KR)
김한 (KR)
김한 (KR)
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