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Title:
BEAM ABLATION LITHOGRAPHY
Document Type and Number:
WIPO Patent Application WO2008010959
Kind Code:
A9
Abstract:
Provided are beam ablation lithography methods capable of removing and manipulating material at the nanoscale. Also provided are nanoscale devices, nanogap field effect transistors, nano-wires, nano-crystals and artificial atoms made using the disclosed methods.

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Inventors:
BRNDIC MARIJA (US)
FISCHBEIN MICHAEL D (US)
Application Number:
PCT/US2007/016006
Publication Date:
April 03, 2008
Filing Date:
July 13, 2007
Export Citation:
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Assignee:
UNIV PENNSYLVANIA (US)
BRNDIC MARIJA (US)
FISCHBEIN MICHAEL D (US)
International Classes:
H01J37/08; H01L21/00
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