Title:
BEAM SCANNING DEVICE AND PATTERN RENDERING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2017/170513
Kind Code:
A1
Abstract:
A scanning unit (Un) for projecting, to a substrate (P), a beam (LBn) deflected by a polygon mirror (PM) having a reflection plane the angle of which changes is provided with: a re-reflection optical system (CY2, M10) which generates a second reflected beam (LBn) directed to the polygon mirror (PM) by reflecting a first reflected beam (LBn) reflected first by the polygon mirror (PM), and converges the second reflected beam (LBn) in a non-deflection direction crossing with the deflection direction of the polygon mirror (PM); and a scanning optical system (FT, CY3) on which a third reflected beam (LBn) generated by reflecting the second reflected beam (LBn) again by the polygon mirror (PM) is incident and which emits the third reflected beam to the substrate (P).
Inventors:
SUZUKI TOMONARI (JP)
KATO MASAKI (JP)
KIUCHI TOHRU (JP)
KATO MASAKI (JP)
KIUCHI TOHRU (JP)
Application Number:
PCT/JP2017/012583
Publication Date:
October 05, 2017
Filing Date:
March 28, 2017
Export Citation:
Assignee:
NIKON CORP (JP)
International Classes:
G02B26/12; B41J2/47; G03F7/20; G03F7/24; H04N1/113
Domestic Patent References:
| WO2015152217A1 | 2015-10-08 |
Foreign References:
| JPS59216121A | 1984-12-06 | |||
| JPH1020235A | 1998-01-23 | |||
| US5392149A | 1995-02-21 | |||
| JPS63175820A | 1988-07-20 | |||
| JPS5188242A | 1976-08-02 |
Attorney, Agent or Firm:
CHIBA Yoshihiro et al. (JP)
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