BIMORPH ELEMENT, BIMORPH SWITCH, MIRROR ELEMENT, AND PROCESS FOR PRODUCING THEM

Title:

BIMORPH ELEMENT, BIMORPH SWITCH, MIRROR ELEMENT, AND PROCESS FOR PRODUCING THEM

Document Type and Number:

WIPO Patent Application WO/2006/025456

Kind Code:

A1

Abstract:

This invention provides a bimorph element comprising a silicon oxide layer, a higher-expansion coefficient layer provided on the silicon oxide layer and having a higher coefficient of thermal expansion than the silicon oxide layer, and a deformation preventive film covering the surface of the silicon oxide layer and capable of preventing the deformation of the silicon oxide layer with the elapse of time. The deformation preventive film may have lower water content and oxygen permeability than the silicon oxide layer and may be silicon oxide in a film form formed at a higher energy than that in the formation of the silicon oxide layer, may be a silicon nitride film, or may be a metal film.

Inventors:

Takayanagi, Fumikazu c/o ADVANTEST CORPORATION (1-32-1 Asahi-cho, Nerima-k, Tokyo 71, 17900, JP)
Sanpei, Hirokazu c/o ADVANTEST CORPORATION (1-32-1 Asahi-ch, Nerima-ku Tokyo, 179-0071, JP)

Application Number:

PCT/JP2005/015928

Publication Date:

March 09, 2006

Filing Date:

August 31, 2005

Export Citation:

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Assignee:

ADVANTEST CORPORATION (1-32-1, Asahi-cho Nerima-k, Tokyo 71, 17900, JP)
Takayanagi, Fumikazu c/o ADVANTEST CORPORATION (1-32-1 Asahi-cho, Nerima-k, Tokyo 71, 17900, JP)
Sanpei, Hirokazu c/o ADVANTEST CORPORATION (1-32-1 Asahi-ch, Nerima-ku Tokyo, 179-0071, JP)

International Classes:

H01H61/01; B81B3/00; G02B26/08; H01H61/013; H01H37/14; H01H37/52

Attorney, Agent or Firm:

Ryuka, Akihiro (5F Shinjuku Square Tower, 22-1 Nishi-Shinjuku 6-chom, Shinjuku-ku Tokyo, 163-1105, JP)

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