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Patent Searching and Data


Title:
BIS-BENZOXAZINONE COMPOUND
Document Type and Number:
WIPO Patent Application WO/2011/064897
Kind Code:
A1
Abstract:
Disclosed is a bis-benzoxazinone compound which has high purity without substantially containing an alkali metal salt and forms a resin composition having excellent hydrolysis resistance when the compound is incorporated in a resin. The bis-benzoxazinone compound is represented by formula (4), wherein (i) the purity is 98% or more; (ii) the content of a compound represented by formula (7) is less than 0.15% by weight; (iii) in the light reflectance measurement in the visible light range of the compound in a powder form, the maximum peak is in the range from 380 to 480 nm, and the maximum light reflectance is from 100 to 120%; (iv) the content of sodium metal is less than 50 ppm; and (v) the YI value is from –10 to 10. In formula (4), R1 and R2 each independently represent a hydrogen atom, a hydroxy group, an alkyl group having 1 to 3 carbon atoms, or the like. Also disclosed are a method for producing the bis-benzoxazinone compound, and a resin composition containing the bis-benzoxazinone compound.

Inventors:
IBUSUKI SHUN (JP)
KOGA TAKASHI (JP)
MIYAKE TERU (JP)
HAYASHI MASAYUKI (JP)
YOSHIDA MASAKANE (JP)
Application Number:
PCT/JP2009/070267
Publication Date:
June 03, 2011
Filing Date:
November 26, 2009
Export Citation:
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Assignee:
TEIJIN CHEMICALS LTD (JP)
IBUSUKI SHUN (JP)
KOGA TAKASHI (JP)
MIYAKE TERU (JP)
HAYASHI MASAYUKI (JP)
YOSHIDA MASAKANE (JP)
International Classes:
C07D265/22; C08L69/00
Domestic Patent References:
WO2009123147A12009-10-08
WO2009041715A12009-04-02
WO2003095557A12003-11-20
WO2003035735A12003-05-01
Foreign References:
JP2005507006A2005-03-10
JP2004526707A2004-09-02
JP2006124600A2006-05-18
JPH07330783A1995-12-19
JP2009286717A2009-12-10
JPS58194854A1983-11-12
JPS61291575A1986-12-22
JP2003155468A2003-05-30
Other References:
See also references of EP 2505585A4
Attorney, Agent or Firm:
OHSHIMA Masataka (JP)
Masataka Oshima (JP)
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