Title:
BISPHENOL FLUORENE ACRYLIC RESIN AND PREPARATION METHOD THEREFOR, QUANTUM DOT-COLOURED PHOTOSENSITIVE RESIN COMPOSITION, PREPARATION METHOD THEREFOR AND USE THEREOF
Document Type and Number:
WIPO Patent Application WO/2017/092650
Kind Code:
A1
Abstract:
Disclosed is a bisphenol fluorene acrylic resin and a preparation method therefor, a quantum dot-coloured photosensitive resin composition, a preparation method therefor and the use thereof. The bisphenol fluorene acrylic resin has the following chemical structural formula (1). The quantum dot-coloured photosensitive resin composition of the present invention is prepared from the following components in parts by weight: 20-50 parts of a sub-pixel colouring agent, 40-90 parts of a grind resin composition, 5-20 parts of a bisphenol fluorene acrylic resin, 10-20 parts of a vinyl light-cured resin, 0.1-0.5 part of a photoinitiator, 0.1-1 part of a co-agent, and 30-50 parts of an organic solvent. The bisphenol fluorene acrylic resin of the present invention is used for preparing a quantum dot-coloured photosensitive resin composition, and the quantum dot-coloured photosensitive resin composition is used for producing colour filters of a pixel below 10 ìm; the colour saturation of the filters is increased, and the producing process is simplified.
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Inventors:
LEE WEI (CN)
YUN XIANGJUN (CN)
FENG JUN (CN)
YUN XIANGJUN (CN)
FENG JUN (CN)
Application Number:
PCT/CN2016/107713
Publication Date:
June 08, 2017
Filing Date:
November 29, 2016
Export Citation:
Assignee:
SHENZHEN ASSOCKEEN CHEMICAL TECH CO LTD (CN)
International Classes:
C08F122/20; G03F7/004; G03F7/027
Foreign References:
CN105504120A | 2016-04-20 | |||
KR101279614B1 | 2013-06-27 | |||
CN104768978A | 2015-07-08 | |||
CN105037627A | 2015-11-11 | |||
CN104945617A | 2015-09-30 | |||
JP2002246744A | 2002-08-30 |
Attorney, Agent or Firm:
GUANGZHOU YUEXIU JILY PATENT & TRADEMARK LAW OFFICE (CN)
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