Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
BISSQUARYLIUM COMPOUND
Document Type and Number:
WIPO Patent Application WO/2007/091683
Kind Code:
A1
Abstract:
Disclosed is a bissquarylium compound represented by the following general formula (I). (I) (In the formula, R1, R2, R3 and R4 independently represent a hydrogen atom, an optionally substituted alkyl group, an optionally substituted aralkyl group, an optionally substituted aryl group or the like; k1 and k2 independently represent an integer of 0-2; R5 and R6 independently represent a halogen atom, a nitro group, a cyano group, a hydroxyl group, a carboxyl group, a mercapto group, a sulfonic acid group or the like; and A and B independently represent an optionally substituted aryl group, an optionally substituted heterocyclic group or the like.)

Inventors:
NIIMI TATSUO
KAMEYAMA KAZUYA
YAMANO JUNZO
Application Number:
PCT/JP2007/052386
Publication Date:
August 16, 2007
Filing Date:
February 09, 2007
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
KYOWA HAKKO CHEMICAL CO LTD (JP)
NIIMI TATSUO
KAMEYAMA KAZUYA
YAMANO JUNZO
International Classes:
C07D239/70; C07D401/14; C07D403/14; C09B23/00; C09K3/00
Domestic Patent References:
WO2000016806A12000-03-30
Foreign References:
JPH10204310A1998-08-04
JPH11216964A1999-08-10
JPH1195421A1999-04-09
JPH08245895A1996-09-24
JPH06263758A1994-09-20
JP2000206685A2000-07-28
JP2000103978A2000-04-11
Attorney, Agent or Firm:
IWAHASHI, Kazuyuki (Intellectual Property Department, 6-1, Ohtemachi 1-chom, Chiyoda-ku Tokyo 85, JP)
Download PDF:
View/Download PDF      PDF Help



 
Previous Patent: FILM FORMING METHOD, PLASMA FILM FORMING APPARATUS AND STORAGE MEDIUM

Next Patent: GASKET AND METHOD FOR PRODUCING THE SAME