Title:
BLACK MATRIX PHOTORESIST COMPOSITION FOR LIQUID CRYSTAL DISPLAY PANEL
Document Type and Number:
WIPO Patent Application WO/2016/076652
Kind Code:
A1
Abstract:
The present invention relates to a black material photoresist composition for a liquid crystal display panel, wherein the composition has no influence on the transmittance of the liquid crystal display panel due to the use of an excellent photopolymerization initiator, suppresses the reduction in the reflectance of a black matrix thin film and the inhibition of generation of color difference, and is advantageous in forming patterns due to favorable deep-section curing. Specifically, an oxime ester fluorene derivative compound used as a photopolymerization initiator in the present invention is represented by chemical formula 1 described in the specification.
Inventors:
OH CHUN-RIM (KR)
KIM HAK-JUN (KR)
CHOI JUNG-SIK (KR)
KIM TAE-OON (KR)
AHN JUNG-MIN (KR)
LEE KYUN-PHYO (KR)
CHO YONG-IL (KR)
KIM HAK-JUN (KR)
CHOI JUNG-SIK (KR)
KIM TAE-OON (KR)
AHN JUNG-MIN (KR)
LEE KYUN-PHYO (KR)
CHO YONG-IL (KR)
Application Number:
PCT/KR2015/012191
Publication Date:
May 19, 2016
Filing Date:
November 12, 2015
Export Citation:
Assignee:
SAMYANG CORP (KR)
International Classes:
G03F7/028; G03F7/027; G09F9/00
Foreign References:
| KR101435652B1 | 2014-08-28 | |||
| KR20130124215A | 2013-11-13 | |||
| US20010012596A1 | 2001-08-09 | |||
| KR20130115272A | 2013-10-21 | |||
| US8133656B2 | 2012-03-13 |
Attorney, Agent or Firm:
PHIL & ONZI INT'L PATENT & LAW FIRM (KR)
특허법인 필앤온지 (KR)
특허법인 필앤온지 (KR)
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