Title:
BLACK PHOTOSENSITIVE COMPOSITION, MANUFACTURING METHOD OF BLACK PHOTOSENSITIVE COMPOSITION, CURED FILM, COLOR FILTER, LIGHT-SHIELDING FILM, OPTICAL ELEMENT, SOLID-STATE IMAGE CAPTURING ELEMENT, AND HEADLIGHT UNIT
Document Type and Number:
WIPO Patent Application WO/2022/210175
Kind Code:
A1
Abstract:
The present invention provides a black photosensitive composition that excels in residue suppression property when forming a pattern and can form a pattern having excellent adhesion at a smaller exposure amount, and also provides a manufacturing method of the black photosensitive composition, a cured film, a color filter, a light-shielding film, an optical element, a solid-state image capturing element, and a headlight unit. The black photosensitive composition according to the present invention includes a black pigment, a resin, a carboxylic acid anhydride, and a polymerizable compound, wherein the carboxylic acid anhydride has a molecular weight of 50-550, the content of the carboxylic acid anhydride is 0.30-10.0% by mass with respect to the total solid content of the black photosensitive composition, and the average particle size of the black pigment is 250 nm or less.
Inventors:
ADACHI MISAHO (JP)
IDEI HIROAKI (JP)
YOKOYAMA NORIFUMI (JP)
IDEI HIROAKI (JP)
YOKOYAMA NORIFUMI (JP)
Application Number:
PCT/JP2022/013566
Publication Date:
October 06, 2022
Filing Date:
March 23, 2022
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
G02B5/20; C09B67/20; C09D4/00; C09D7/61; C09D7/62; C09D7/63; G02B5/00; G03F7/004; G03F7/027; H01L27/146
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Attorney, Agent or Firm:
ITOH Hideaki et al. (JP)
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