Title:
BLANK OF TIO2-SIO2 GLASS FOR A MIRROR SUBSTRATE FOR USE IN EUV LITHOGRAPHY AND METHOD FOR THE PRODUCTION THEREOF
Document Type and Number:
WIPO Patent Application WO/2014/122111
Kind Code:
A3
Abstract:
To provide a blank of TiO2-SiO2 glass for a mirror substrate for use in EUV lithography, in which the need for adaptation to optimize the progression of the coefficient of thermal expansion, and consequently also the progression of the zero crossing temperature Tzc, is low, the TiO2-SiO2 glass has at a mean value of the fictive temperature Tf in the range between 920°C and 970°C a dependence of its zero crossing temperature Tzc on the fictive temperature Tf which, expressed as the differential quotient dTzc/dTf, is less than 0.3.
Inventors:
THOMAS STEPHAN (DE)
BECKER KLAUS (DE)
OCHS STEFAN (DE)
BECKER KLAUS (DE)
OCHS STEFAN (DE)
Application Number:
PCT/EP2014/052106
Publication Date:
October 23, 2014
Filing Date:
February 04, 2014
Export Citation:
Assignee:
HERAEUS QUARZGLAS (DE)
SHINETSU QUARTZ PROD (JP)
SHINETSU QUARTZ PROD (JP)
International Classes:
G03B19/14; C03B20/00; C03B32/00; C03C3/06; G02B5/08; G03F7/20
Foreign References:
| DE102010009589A1 | 2011-09-01 | |||
| DE102011085358B3 | 2012-07-12 | |||
| US20090143213A1 | 2009-06-04 | |||
| DE102010039924A1 | 2011-03-03 | |||
| DE10359102A1 | 2005-07-21 |
Other References:
See also references of EP 2954372A2
Attorney, Agent or Firm:
STAUDT, Armin (Hanau, DE)
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