Title:
BLOCK COPOLYMER COMPOSITION, PRODUCTION METHOD THEREFOR, AND FILM
Document Type and Number:
WIPO Patent Application WO/2015/099163
Kind Code:
A1
Abstract:
The present invention provides: a block copolymer composition which includes a block copolymer (A) represented by formula (A) and a block copolymer (B) represented by formula (B), and which, after having been moulded into a pellet shape and dried, has a moisture content when left to rest for 24 hours under conditions in which the temperature is 37˚C and the relative humidity is 70% of not more than 200 ppm by weight; a production method for the block copolymer composition; and a film obtained by melt moulding the resin composition. In formula (A) and formula (B), Ar1a, Ar1b, and Ar2b are aromatic vinyl polymer blocks having a weight average molecular weight of 6,000-18,000, Ar2a is an aromatic vinyl polymer block having a weight average molecular weight of 40,000-400,000, and Da and Db are conjugated diene polymer blocks which satisfy specific conditions. According to the present invention, provided is a block copolymer composition which has both a high elastic modulus and a low permanent elongation, and with which the formation of holes is inhibited when obtaining a film using melt moulding.
Inventors:
ODA RYOJI (JP)
ISHII YUTA (JP)
ISHII YUTA (JP)
Application Number:
PCT/JP2014/084665
Publication Date:
July 02, 2015
Filing Date:
December 26, 2014
Export Citation:
Assignee:
ZEON CORP (JP)
International Classes:
C08L53/02; C08J5/18
Domestic Patent References:
WO2012063812A1 | 2012-05-18 | |||
WO2009123089A1 | 2009-10-08 |
Foreign References:
JP2013139514A | 2013-07-18 | |||
JP2011143615A | 2011-07-28 | |||
JP2006089593A | 2006-04-06 | |||
JP2008274299A | 2008-11-13 | |||
JP2005332843A | 2005-12-02 | |||
JP2005139265A | 2005-06-02 | |||
JP2010202716A | 2010-09-16 | |||
US20110046307A1 | 2011-02-24 | |||
JP2010202716A | 2010-09-16 |
Other References:
RUBBER CHEM. TECHNOL., vol. 45, 1972, pages 1295
Attorney, Agent or Firm:
OHISHI HARUHITO (JP)
Haruhito Oishi (JP)
Haruhito Oishi (JP)
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