Title:
BLOCK COPOLYMER COMPRISING PHOTO-SENSITIVE GROUP
Document Type and Number:
WIPO Patent Application WO/2019/147009
Kind Code:
A1
Abstract:
The present application may provide a block copolymer and a use thereof. The block copolymer of the present application may provide a block copolymer having an excellent self-assembling property or phase-separation characteristics and simultaneously having a characteristic capable of altering a self-assembled structure once formed or capable of forming a pattern of phase separated structures in a polymeric membrane.
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Inventors:
PARK NO JIN (KR)
KIM JIN KON (KR)
CHOI CHUNG RYONG (KR)
YOON SUNG SOO (KR)
KIM JIN KON (KR)
CHOI CHUNG RYONG (KR)
YOON SUNG SOO (KR)
Application Number:
PCT/KR2019/000947
Publication Date:
August 01, 2019
Filing Date:
January 23, 2019
Export Citation:
Assignee:
LG CHEMICAL LTD (KR)
International Classes:
C08F299/00; C08F212/08; C08F226/06; C08J5/18; C08L53/00
Domestic Patent References:
| WO2017058676A1 | 2017-04-06 |
Foreign References:
| KR20140127299A | 2014-11-03 | |||
| KR20140142240A | 2014-12-11 | |||
| KR20130050874A | 2013-05-16 | |||
| KR20180010050A | 2018-01-30 |
Other References:
TOPHAM, P.D. ET . AL.: "The performance of poly(styrene)-block-poly(2-vinylpyridine)-block-poly(styrene) triblock copolymers as pH-driven actuators.", THE ROYAL SOCIETY OF CHEMISTRY, vol. 3, 2007, pages 1506 - 1512, XP055691260, DOI: 10.1039/B711125H
See also references of EP 3736302A4
See also references of EP 3736302A4
Attorney, Agent or Firm:
DANA PATENT LAW FIRM (KR)
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