Title:
BLOCK COPOLYMER COMPRISING PHOTOSENSITIVE GROUP
Document Type and Number:
WIPO Patent Application WO/2018/074806
Kind Code:
A1
Abstract:
The present application can provide a block copolymer and a use thereof. The present application can provide a block copolymer and a use thereof. The block copolymer of the present application can provide a block copolymer which has excellent self-assembly properties or phase-separation properties and simultaneously has the properties enabling a change of a self-assembled structure once formed, or which can form a pattern of phase-separated structures on a polymer membrane.
Inventors:
PARK NO JIN (KR)
KIM JIN KON (KR)
CHOI CHUNG RYONG (KR)
YOON SUNG SOO (KR)
KIM JIN KON (KR)
CHOI CHUNG RYONG (KR)
YOON SUNG SOO (KR)
Application Number:
PCT/KR2017/011442
Publication Date:
April 26, 2018
Filing Date:
October 17, 2017
Export Citation:
Assignee:
LG CHEMICAL LTD (KR)
International Classes:
C08F220/18; C08F226/10; C08F299/00; C08J5/22
Foreign References:
| US8378041B2 | 2013-02-19 |
Other References:
ZHOU, Q.-H. ET AL.: "Biodegradable Micelles Self-assembled from Miktoarm Star Block Copolymers for MTX Delivery", COLLOID AND POLYMER SCIENCE, vol. 293, no. 8, 19 May 2015 (2015-05-19), pages 2291 - 2300, XP035512798
LIU, H. ET AL.: "Synthesis of Multifunctional ABC Stars with a Reduction-labile Arm by Consecutive ROP, RAFT and ATRP Processes", SCIENCE CHINA CHEMISTRY, vol. 58, no. 11, 15 June 2015 (2015-06-15), pages 1724 - 1733, XP035574624
KANG, M. ET AL.: "Synthesis of Photocleavable Poly (styrene-block-ethylene oxide) and Its Self-Assembly into Nanoporous Thin Films", MACROMOLECULES, vol. 42, no. 1, 16 December 2008 (2008-12-16), pages 455 - 458, XP055478475
XUAN, J. ET AL.: "Dual-stimuli-responsive Micelle of an ABC Triblock Copolymer Bearing a Redox-cleavable Unit and a Photocleavable Unit at Two Block Junctions", LANGMUIR, vol. 30, 11 December 2013 (2013-12-11), pages 410 - 417, XP055478477
LIU, H. ET AL.: "Synthesis of Multifunctional ABC Stars with a Reduction-labile Arm by Consecutive ROP, RAFT and ATRP Processes", SCIENCE CHINA CHEMISTRY, vol. 58, no. 11, 15 June 2015 (2015-06-15), pages 1724 - 1733, XP035574624
KANG, M. ET AL.: "Synthesis of Photocleavable Poly (styrene-block-ethylene oxide) and Its Self-Assembly into Nanoporous Thin Films", MACROMOLECULES, vol. 42, no. 1, 16 December 2008 (2008-12-16), pages 455 - 458, XP055478475
XUAN, J. ET AL.: "Dual-stimuli-responsive Micelle of an ABC Triblock Copolymer Bearing a Redox-cleavable Unit and a Photocleavable Unit at Two Block Junctions", LANGMUIR, vol. 30, 11 December 2013 (2013-12-11), pages 410 - 417, XP055478477
Attorney, Agent or Firm:
DANA PATENT LAW FIRM (KR)
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