Title:
BLOCK COPOLYMER AND RESIST UNDERLAYER FILM-FORMING COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2012/169580
Kind Code:
A1
Abstract:
[Problem] To provide a novel block copolymer, a method for producing the same, and a lithographic resist underlayer film-forming composition using the block copolymer. [Solution] A block copolymer having a structure represented by formula (1), where P and Q each independently represent a divalent organic group between two carbon atoms; s, t, and u each independently represent an integer 10 or higher; the two R1s each independently represent a hydrogen atom or methyl group; the two R2s each independently represent a hydrogen atom, phenyl group, benzyl group, naphthyl group, anthracenyl group, C1-13 alkyl group, or a group including a lactone ring, at least one hydrogen atom of the phenyl group, naphthyl group, anthracenyl group, or alkyl group being optionally substituted by a hydroxyl group, C1-13 alkoxy group, or halogen atom; and the two X's each independently represent an ester bond, an amide bond, or a single bond.
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Inventors:
SAKAMOTO RIKIMARU (JP)
HO BANGCHING (JP)
HO BANGCHING (JP)
Application Number:
PCT/JP2012/064668
Publication Date:
December 13, 2012
Filing Date:
June 07, 2012
Export Citation:
Assignee:
NISSAN CHEMICAL IND LTD (JP)
SAKAMOTO RIKIMARU (JP)
HO BANGCHING (JP)
SAKAMOTO RIKIMARU (JP)
HO BANGCHING (JP)
International Classes:
C08G59/40; G03F7/11; H01L21/027
Domestic Patent References:
| WO2009104685A1 | 2009-08-27 | |||
| WO2006115074A1 | 2006-11-02 | |||
| WO2009057458A1 | 2009-05-07 | |||
| WO2011074494A1 | 2011-06-23 |
Foreign References:
| JP2011099034A | 2011-05-19 | |||
| JP2004212907A | 2004-07-29 | |||
| JP2004051876A | 2004-02-19 |
Attorney, Agent or Firm:
HANABUSA, Tsuneo et al. (JP)
Sepal Tsuneo (JP)
Sepal Tsuneo (JP)
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Claims: