Title:
BOTTOM LAYER FILM-FORMATION COMPOSITION OF SELF-ORGANIZING FILM CONTAINING POLYCYCLIC ORGANIC VINYL COMPOUND
Document Type and Number:
WIPO Patent Application WO/2014/097993
Kind Code:
A1
Abstract:
[Problem] To provide a bottom layer film of a self-organizing film that forms a vertical pattern in the self-organizing film without causing intermixing (layer mixing) with a top-layer self-organizing film. [Solution] This bottom layer film-formation composition of a self-organizing film is characterized by containing a polymer having at least 0.2 mol% of a unit structure of a polycyclic aromatic vinyl compound with respect to all the unit structures of the polymer. The polymer has at least 20 mol% of a unit structure of an aromatic vinyl compound with respect to all the unit structures of the polymer, and has at least 1 mol% of a unit structure of a polycyclic aromatic vinyl compound with respect to all of the unit structures of aromatic vinyl compound. The aromatic vinyl compound contains vinylnaphthylene, acenaphthylene, or vinylcarbazole, which each may be substituted, and the polycyclic aromatic vinyl compound is vinylnaphthlylene, acenaphthylene, or vinylcarbazole. Also, the aromatic vinyl compound contains vinylnaphthylene, acenaphthylene, or vinylcarbazole, which each may be substituted, and an optionally substituted styrene, and the polycyclic aromatic vinyl compound is vinylnaphthlylene, acenaphthylene, or vinylcarbazole.
Inventors:
SOMEYA YASUNOBU (JP)
WAKAYAMA HIROYUKI (JP)
ENDO TAKAFUMI (JP)
SAKAMOTO RIKIMARU (JP)
WAKAYAMA HIROYUKI (JP)
ENDO TAKAFUMI (JP)
SAKAMOTO RIKIMARU (JP)
Application Number:
PCT/JP2013/083492
Publication Date:
June 26, 2014
Filing Date:
December 13, 2013
Export Citation:
Assignee:
NISSAN CHEMICAL IND LTD (JP)
International Classes:
C09D201/00; B05D1/38; B05D3/10; B05D7/24; C09D5/00; C09D125/00; C09D139/04; C09D145/00; G03F7/11; G03F7/26; H01L21/027
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Other References:
TOSHIKO MIZOKURO ET AL., JAPANESE JOURNAL OF APPLIED PHYSICS, vol. 42, 2003, pages L983
KOJI ASAKAWA ET AL., JAPANESE JOURNAL OF APPLIED PHYSICS, vol. 41, 2002, pages 6112
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See also references of EP 2937391A4
KOJI ASAKAWA ET AL., JAPANESE JOURNAL OF APPLIED PHYSICS, vol. 41, 2002, pages 6112
RACHEL A. SEGALAMAN, MATERIALS SCIENCE AND ENGINEERING, vol. R48, 2005, pages 191
See also references of EP 2937391A4
Attorney, Agent or Firm:
HANABUSA, Tsuneo et al. (JP)
Sepal Tsuneo (JP)
Sepal Tsuneo (JP)
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