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Title:
BREATHING FILTER UNIT FOR N2 GAS PURGE, AND PURGE DEVICE FOR N2 GAS PURGING SEMICONDUCTOR WAFER HOUSING CONTAINER EQUIPPED WITH THE FILTER UNIT
Document Type and Number:
WIPO Patent Application WO/2012/014940
Kind Code:
A1
Abstract:
Provided is a device which facilitates the removal of water within a breathing filter unit after a semiconductor wafer housing container is cleaned and removes in advance dust adhering to the interior of the breathing filter unit, a nozzle unit of a purge device, valves, and pipes before the start of N2 gas purge. The breathing filter unit is provided with a filter (6) in an upper-end opening (46) made in the upper part of a cylindrical casing (41), and two ventilating openings of an N2 gas supply-side ventilating opening (7) and a residual gas exhaust-side ventilating opening (8) are made in the bottom part (42) of the cylindrical casing (41). A shutter means (10) which opens only when N2 gas (30) is supplied into the breathing filter unit (1) is installed in the N2 gas supply-side ventilating opening (7). A shutter means (11) which opens only when residual gas (31) in the breathing filter unit (1) is discharged from the ventilating opening is installed in the residual gas exhaust-side ventilating opening (8).

Inventors:
KISAKIBARU TOSHIROU (JP)
Application Number:
PCT/JP2011/067128
Publication Date:
February 02, 2012
Filing Date:
July 27, 2011
Export Citation:
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Assignee:
KONDOH IND LTD (JP)
CAMBRIDGE FILTER JAPAN LTD (JP)
KISAKIBARU TOSHIROU (JP)
International Classes:
H01L21/673
Foreign References:
JP2007005599A2007-01-11
JP2007511098A2007-04-26
JP2006005193A2006-01-05
Attorney, Agent or Firm:
YAMASAKI, Yukuzo et al. (JP)
Yukuzo Yamazaki (JP)
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Claims: