Title:
THE BROKEN AND NEVER RETRIEVABLE ELECTRON SOFT MARK
Document Type and Number:
WIPO Patent Application WO/2007/104179
Kind Code:
A1
Abstract:
The present invention relates an electron safe mark, in particular broken and never
retrievable electron soft mark. The mark includes an insulating film layer and
two conducting layers attached on the two surfaces of the insulating film, the
conducting layer has circuit, and the insulating film layer and the conducting layers
form the mark base layer, a rigid insulating material layer is attached the base
layer, the broken moulage processed in advance is on the rigid insulating material
layer, and there is an angle between the broken moulage and the circuit.The problem
due to folding the decoded mark to produce little fillet so as to break off the mark
difficultly is resolved by the said construction,so the circuit of the mark is
destroyed, the retrievement of the mark is avoided.
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Inventors:
HUANG, Guangwei (No. 1695, Xin Tan Wa Road Nanhui District, Shanghai 1, 201321, CN)
黄光伟 (中国上海市南汇区新坦瓦公路1695号, Shanghai 1, 201321, CN)
黄光伟 (中国上海市南汇区新坦瓦公路1695号, Shanghai 1, 201321, CN)
Application Number:
CN2006/000378
Publication Date:
September 20, 2007
Filing Date:
March 13, 2006
Export Citation:
Assignee:
HUANG, Guangwei (No. 1695, Xin Tan Wa Road Nanhui District, Shanghai 1, 201321, CN)
黄光伟 (中国上海市南汇区新坦瓦公路1695号, Shanghai 1, 201321, CN)
黄光伟 (中国上海市南汇区新坦瓦公路1695号, Shanghai 1, 201321, CN)
International Classes:
G06K19/00
Attorney, Agent or Firm:
SHANGHAI XIN TIAN PATENT AGENT CO., LTD. (Room 1606, No. 59 Nan Chang Road, Shanghai 0, 200020, CN)
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