Title:
CAPACITIVE SILICON MICROPHONE AND PREPARATION METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2015/078227
Kind Code:
A1
Abstract:
Provided are a capacitive silicon microphone and a preparation method therefor. The capacitive silicon microphone comprises: a first dielectric layer arranged on a substrate with a back cavity; a lower polar plate located above the back cavity; a first elastic component having an inner edge connected to the edge of the lower polar plate and an outer edge located on an upper surface of the first dielectric layer; a second dielectric layer located at the outer edge of the first elastic component and corresponding to the upper part of the first dielectric layer; an upper polar plate having a plurality of release holes and formed above the lower polar plate by taking one air gap as an interval; and a second elastic component having an inner edge connected to the edge of the upper polar plate and an outer edge located on an upper surface of the second dielectric layer, wherein as a vibration membrane of the silicon microphone of the present invention, the first elastic component will help to release the structural stress of a film layer, increase the sensitivity of the lower polar plate to sound pressure, and reduce the structural stress of the film layer at the same time; and as a back electrode, the second elastic component will effectively release the structural stress caused by the film layer and the dielectric layers, increase the flatness of the film layer, and reduce the overall noise of an MEMS microphone.
Inventors:
ZHAO YUHANG (CN)
WANG YONG (CN)
KANG XIAOXU (CN)
CHEN YAN (CN)
WANG YONG (CN)
KANG XIAOXU (CN)
CHEN YAN (CN)
Application Number:
PCT/CN2014/087491
Publication Date:
June 04, 2015
Filing Date:
September 26, 2014
Export Citation:
Assignee:
SH INTEGRATED CIRCUIT RES & DE (CN)
International Classes:
H04R19/04
Foreign References:
| CN103607684A | 2014-02-26 | |||
| CN102452635A | 2012-05-16 | |||
| CN102024754A | 2011-04-20 |
Attorney, Agent or Firm:
SHANGHAI TIANCHEN INTELLECTUAL PROPERTY AGENCY (CN)
上海天辰知识产权代理事务所（特殊普通合伙） (CN)
上海天辰知识产权代理事务所（特殊普通合伙） (CN)
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