Title:
CARBAZOLE DERIVATIVE, AND PHOTOPOLYMERIZATION INITIATOR AND PHOTORESIST COMPOSITION WHICH COMPRISE SAME
Document Type and Number:
WIPO Patent Application WO/2019/022447
Kind Code:
A1
Abstract:
The present invention relates to: a novel carbazole derivative; and a photopolymerization initiator and a photoresist composition which comprise the same. According to the present invention, the carbazole derivative includes both an oxime ester group and a phosphonate group within one molecule, and thus, compared to a conventional photopolymerization initiator, can effectively absorb ultraviolet rays and implement high sensitivity, heat resistance and chemical resistance. In addition, provided are a photopolymerization initiator and a photoresist composition which comprise the carbazole derivative, thereby enabling an excellent residual film rate, developability and strength to be implemented.
Inventors:
KIM SUNGHYUN (KR)
KIM SANGHA (KR)
KIM SU MI (KR)
KIM SANGHA (KR)
KIM SU MI (KR)
Application Number:
PCT/KR2018/008258
Publication Date:
January 31, 2019
Filing Date:
July 23, 2018
Export Citation:
Assignee:
CHEME INC (KR)
International Classes:
C07D209/82; C07D209/86; G02B5/20; G03F7/00; G03F7/004; G03F7/029
Foreign References:
| KR20150063016A | 2015-06-08 | |||
| KR20130083188A | 2013-07-22 | |||
| JP2007025645A | 2007-02-01 | |||
| JPH1171449A | 1999-03-16 | |||
| KR20090051858A | 2009-05-25 |
Attorney, Agent or Firm:
PLUS INTERNATIONAL IP LAW FIRM (KR)
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