Title:
CARBOXYLIC ACID MODIFIED NITRILE BASED COPOLYMER COMPOSITION AND DIP MOLDED ARTICLE MANUFACTURED THEREFROM
Document Type and Number:
WIPO Patent Application WO/2014/142424
Kind Code:
A1
Abstract:
The present invention relates to a carboxylic acid modified nitrile based copolymer composition and a dip molded article manufactured therefrom, and more specifically, the present substrate provides a copolymer composition characterized by comprising a carboxylic acid modified nitrile based copolymer latex having a glass transition temperature of -60 to -10℃ and a carboxylic acid modified styrene based copolymer latex having a glass transition temperature of 30 to 110℃, and a dip molded article manufactured therefrom. Accordingly, the present invention has an effect of providing a carboxylic acid modified nitrile based copolymer composition enabling the manufacture of a dip molded product, which has significantly improved donning and doffing characteristics while retaining existing physical properties, and a dip molded article manufactured therefrom.
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Inventors:
HAN JUNG SU (KR)
YEU SEUNG UK (KR)
YANG SEUNG HUN (KR)
YEU SEUNG UK (KR)
YANG SEUNG HUN (KR)
Application Number:
PCT/KR2013/011771
Publication Date:
September 18, 2014
Filing Date:
December 18, 2013
Export Citation:
Assignee:
LG CHEMICAL LTD (KR)
International Classes:
C08L13/02; B29C41/02; C08F8/46; C08L9/04
Foreign References:
KR20070114106A | 2007-11-29 | |||
KR100235128B1 | 2000-03-02 | |||
KR20120006922A | 2012-01-19 | |||
KR100357412B1 | 2003-02-11 | |||
KR20100033125A | 2010-03-29 |
Attorney, Agent or Firm:
CHO, INJE (KR)
조인제 (KR)
조인제 (KR)
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