A CARRIER HEAD WITH A FLEXIBLE MEMBRANE FOR CHEMICAL MECHANICAL POLISHING

Title:

A CARRIER HEAD WITH A FLEXIBLE MEMBRANE FOR CHEMICAL MECHANICAL POLISHING

Document Type and Number:

WIPO Patent Application WO2000021714

Kind Code:

A9

Abstract:

A carrier head for a chemical mechanical polishing apparatus has a base, a flexible membrane extending beneath the base to define a pressurizable chamber, a support structure positioned in the chamber, and a spacer ring positioned outside the chamber. The flexible membrane includes a lower surface of the flexible membrane providing a mounting surface for a substrate, and a perimeter portion that extends in a serpentine path between the spacer ring and the support structure.

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Inventors:

CHEN HUNG
ZUNIGA STEVEN

Application Number:

PCT/US1999/022181

Publication Date:

September 14, 2000

Filing Date:

September 23, 1999

Export Citation:

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Assignee:

APPLIED MATERIALS INC (US)

International Classes:

B24B37/30; B24B37/32; H01L21/304; (IPC1-7): B24B37/04; B24B41/06

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