Title:
CARRIER FOR SUPPORTING AT LEAST ONE SUBSTRATE DURING A SPUTTER DEPOSITION PROCESS, APPARATUS FOR SPUTTER DEPOSITION ON AT LEAST ONE SUBSTRATE, AND METHOD FOR SPUTTER DEPOSITION ON AT LEAST ONE SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2017/005290
Kind Code:
A8
Abstract:
A carrier (100) for supporting at least one substrate during a sputter deposition process is provided. The carrier (100) includes a carrier body (102) and an insulating portion provided at the carrier body (102). The insulating portion provides a surface (103) of an electrically insulating material, wherein the surface (103) is configured to face one or more sputter deposition sources during the sputter deposition process.
More Like This:
| JP2007204785 | PARTICLE COATING METHOD AND PARTICLE COATING APPARATUS |
| JP7051379 | Film forming equipment and embedding processing equipment |
| JPH01319966 | SPUTTERING DEVICE |
Inventors:
KELLER STEFAN (DE)
BRÜNING ANDRE (DE)
SCHÜSSLER UWE (DE)
ZILBAUER THOMAS WERNER (DE)
BANGERT STEFAN (DE)
BRÜNING ANDRE (DE)
SCHÜSSLER UWE (DE)
ZILBAUER THOMAS WERNER (DE)
BANGERT STEFAN (DE)
Application Number:
PCT/EP2015/065366
Publication Date:
January 11, 2018
Filing Date:
July 06, 2015
Export Citation:
Assignee:
APPLIED MATERIALS INC (US)
KELLER STEFAN (DE)
BRÜNING ANDRE (DE)
SCHÜSSLER UWE (DE)
ZILBAUER THOMAS WERNER (DE)
BANGERT STEFAN (DE)
KELLER STEFAN (DE)
BRÜNING ANDRE (DE)
SCHÜSSLER UWE (DE)
ZILBAUER THOMAS WERNER (DE)
BANGERT STEFAN (DE)
International Classes:
C23C14/50; C23C14/34; C23C14/56; H01J37/32
Attorney, Agent or Firm:
ZIMMERMANN & PARTNER PATENTANWÄLTE MBB (DE)
Download PDF: