CATHODE STRUCTURE AND PROCESS FOR PRODUCING SAME - NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY

Title:

CATHODE STRUCTURE AND PROCESS FOR PRODUCING SAME

Document Type and Number:

WIPO Patent Application WO/2011/122526

Kind Code:

A1

Abstract:

A phenomenon was observed in which an LaB6 film deposited by sputtering had impaired crystallinity. When an LaB6 film is deposited on a substrate by sputtering, the sputtering is conducted, in an atmosphere to which nitrogen gas has been added, directly on the substrate or through a film comprising a nitride of a component of the substrate. Thus, an LaB6 film having excellent crystallinity is obtained.

Inventors:

OHMI, Tadahiro (1-1 Katahira 2-chome, Aoba-ku, Sendai-sh, Miyagi 77, 〒9808577, JP)
大見　忠弘 (〒77 宮城県仙台市青葉区片平二丁目１番１号　国立大学法人東北大学内 Miyagi, 〒9808577, JP)
GOTO, Tetsuya (1-1 Katahira 2-chome, Aoba-ku, Sendai-sh, Miyagi 77, 〒9808577, JP)
後藤　哲也 (〒77 宮城県仙台市青葉区片平二丁目１番１号　国立大学法人東北大学内 Miyagi, 〒9808577, JP)

Application Number:

JP2011/057550

Publication Date:

October 06, 2011

Filing Date:

March 28, 2011

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Assignee:

NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY (1-1 Katahira 2-chome, Aoba-ku Sendai-sh, Miyagi 77, 〒9808577, JP)
国立大学法人東北大学 (〒77 宮城県仙台市青葉区片平二丁目１番１号 Miyagi, 〒9808577, JP)
OHMI, Tadahiro (1-1 Katahira 2-chome, Aoba-ku, Sendai-sh, Miyagi 77, 〒9808577, JP)
大見　忠弘 (〒77 宮城県仙台市青葉区片平二丁目１番１号　国立大学法人東北大学内 Miyagi, 〒9808577, JP)
GOTO, Tetsuya (1-1 Katahira 2-chome, Aoba-ku, Sendai-sh, Miyagi 77, 〒9808577, JP)

International Classes:

H01J9/02; C23C14/06; H01J61/06; H01J61/067

Attorney, Agent or Firm:

IKEDA, Noriyasu et al. (Hibiya Daibiru Bldg, 2-2 Uchisaiwaicho 1-chome, Chiyoda-k, Tokyo 11, 〒1000011, JP)

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Claims:

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