Title:
CERIA-BASED COMPOSITE FINE PARTICLE DISPERSION, PRODUCTION METHOD THEREFOR, AND POLISHING ABRASIVE GRAIN DISPERSION INCLUDING CERIA-BASED COMPOSITE FINE PARTICLE DISPERSION
Document Type and Number:
WIPO Patent Application WO/2018/221357
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing a ceria-based composite particle dispersion which is capable of performing polishing at high speed, even for silica films, Si wafers, and difficult to process materials, and which is simultaneously capable of achieving high surface accuracy. The present invention solves the abovementioned problem by providing a ceria-based composite fine particle dispersion which includes ceria-based composite fine particles which have an average particle size of 50-350 nm, and which have the following characteristics. The ceria-based composite fine particles are each provided with: a mother particle; a cerium-containing silica layer; child particles; and a layer including readily soluble silica. The mother particle has amorphous silica as a main component. The child particles have crystalline ceria as a main component. The ratio of the mass of the layer including the readily soluble silica to the mass of the ceria-based composite fine particles is in a specific range. The mass ratio of silica to ceria in the ceria-based composite fine particles is in a specific range. When the ceria-based composite fine particles are subjected to X-ray diffraction, only the crystal phase of the ceria is detected. The average crystallite size of the crystalline ceria measured by subjecting the ceria-based composite fine particles to X-ray diffraction is 10-25 nm.
Inventors:
KOMATSU MICHIO (JP)
NISHIDA HIROYASU (JP)
TAWARAZAKO YUJI (JP)
USUDA SHINYA (JP)
NAKAYAMA KAZUHIRO (JP)
NISHIDA HIROYASU (JP)
TAWARAZAKO YUJI (JP)
USUDA SHINYA (JP)
NAKAYAMA KAZUHIRO (JP)
Application Number:
PCT/JP2018/019902
Publication Date:
December 06, 2018
Filing Date:
May 23, 2018
Export Citation:
Assignee:
JGC CATALYSTS & CHEMICALS LTD (JP)
International Classes:
C01B33/12; B24B37/00; C01F17/229; C01F17/235; C09G1/02; C09K3/14; H01L21/304
Domestic Patent References:
| WO2016159167A1 | 2016-10-06 | |||
| WO2016129476A1 | 2016-08-18 |
Foreign References:
| JP2017043531A | 2017-03-02 | |||
| US20120077419A1 | 2012-03-29 | |||
| JPH09132770A | 1997-05-20 | |||
| JP2746861B2 | 1998-05-06 | |||
| JP2013119131A | 2013-06-17 | |||
| JP2017109087A | 2017-06-22 | |||
| JP2017118993A | 2017-07-06 |
Other References:
SEUNG-HO LEEZHENYU LUS.V.BABUEGON MATIJEVIC: "Chemical mechanical polishing of thermal oxide films using silica particles coated with ceria", JOURNAL OF MATERIALS RESEARCH, vol. 17, no. 10, 2002, pages 2744 - 2749, XP002371690
See also references of EP 3632848A4
See also references of EP 3632848A4
Attorney, Agent or Firm:
MIGITA, Shunsuke et al. (JP)
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