CERIUM BASED ABRASIVE MATERIAL AND ABRASIVE MATERIAL SLURRY, AND METHOD FOR PRODUCING CERIUM BASED ABRASIVE MATERIAL

WIPO Patent Application WO/2002/072726

A1

A cerium based abrasive material containing cerium oxide as a primary component, characterized in that abrasive material particles constituting the abrasive material are covered with at least one of a silicon component comprising silicon or a silicon compound and an aluminum component comprising aluminum or an aluminum compound; and a method for producing the abrasive material which comprises subjecting a cerium based abrasive material to wet dispersion in a dispersion medium, to prepare a slurry, and adding a treating solution containing at least one of a silicon compound and an aluminum compound to the slurry, to treat the surface of the abrasive material, or which comprises adding a treating solution containing at least one of a silicon compound and an aluminum compound to a slurry during or after a pulverization step of a conventional process for producing a cerium based abrasive material, to treat the surface of the conventional abrasive material, followed by roasting and then classifying.

ITO TERUNORI (JP)
MOCHIZUKI NAOYOSHI (JP)
USHIYAMA KAZUYA (JP)
WATANABE HIROYUKI (JP)

PCT/JP2002/002170

September 19, 2002

March 08, 2002

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MITSUI MINING & SMELTING CO (JP)
ITO TERUNORI (JP)
MOCHIZUKI NAOYOSHI (JP)
USHIYAMA KAZUYA (JP)
WATANABE HIROYUKI (JP)

B24B37/00; C09C1/68; C09G1/02; C09K3/14; H01L21/304; (IPC1-7): C09K3/14; B24B57/02; H01L21/304

WO2000008678A1

2000-02-17

US5766279A	1998-06-16
EP0874036A1	1998-10-28
JP2000265160A	2000-09-26
JP2001284296A	2001-10-12

See also references of EP 1380627A4

Tanaka, Daisuke (15-2 Hongo 1-chome Bunkyo-ku, Tokyo, JP)

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